Programma van VCCN Symposium Product Cleanliness 2021

Philip van Beek - Chairman of the day
I am a highly driven professional with 30 years of experience in cleanrooms and technical applications concerning Contamination Control.
Professional education on Contamination Control with accredited courses like Cleanroom testing
I have experience with engineering and building cleanrooms in different applications including: micro-electronics, pharmaceutical, food industry, medical, operating theatres, space industry. For example at Philips, Akzo Nobel, Solvay pharmaceuticals, GSK, TNO, Technical University Delft, ESA-Estec, Nutricia, RIVM. Globally consulting on Contamination Control applications.

Vacuum cleanliness has become very important in several applications. With this cleanliness need, the cost of production has increased significantly. This presentation will explain with examples from the field why the right cleanliness level at the right location is needed, and applying the right level at the right location can save cost.

Freek Molkenboer - Senior systems engineer at TNO
I am Senior Systems Engineer at TNO working mostly on high complex systems involving vacuum or contamination related issues.

There are several possibilities to determine the cleanliness of a certain product by means of an independent measurement. Sometimes this can be done on site by local engineers, but often, also in view of the often strict requirements, the help of a specialized laboratory is needed to determine the cleanliness with dedicated developed procedures and specialized equipment. The presentation includes not only a global overview of the available techniques but also for which they can be used and, where possible, will be illustrated with practical examples.

Paul Krüsemann -  Manager Cleanliness Qualification Lab at  Eurofins Materials Science Netherlands BV
Eurofins Materials Science NL has been around for three years but has a long Philips history. Originally the Material Analysis lab of Philips Research and via Philips Lighting ended up in the Eurofins group. The lab is set up for anyone who needs chemical or physical analytical support for R&D research or trouble shooting in any environment. The lab has a wide range of measurement techniques at its disposal, performed by almost 50 highly trained employees who not only perform the measurements but also contribute to the solution of the ultimate problem. I myself have been working in this lab for more than 35 years and I am specialized in gas analysis in general and contamination control in particular. The focus area is currently mainly on the semi-conductor industry, but our expertise is also regularly applied to contamination control issues in other branches.

Suppliers deliver to multiple OEM-ers with different Cleanliness demands. This is often done with a single (or limited) facilities. This presentation focusses on how to manage the different demands in limited facilities and how to keep the clean assembly under control.

Olof Teulings -  Process Engineer at NTS Campus Eindhoven
I have been working on cleanrooms and it’s cleanliness for over 10 years. It started with the VCCN – Cleanroom Technology Education and after that a lot of practice in improving the Clean way-of-working and building expansions for two different companies.

I am a member of the Cleanliness Competence Team of NTS and working full time on improvement of the cleanroom, Clean way-of-working, rebuilding the cleanrooms, 2nd line support for production cleanliness problems and assisting other NTS cleanrooms.  

The semiconductor industry is very much relying on clean environments and clean components in their manufacturing equipment. As the size of the structures on a microchip are decreasing more and more, the presence of particles and other forms of contamination is driving many research programs to detect smaller particles and all kinds of metallic and organic contamination.
It also leads to new measurement methods to find those contaminants and classify them in a different way. Not only static, but also dynamic.

This presentation will highlight several of those developments and will challenge the audience to define what levels of cleanliness should be reached.

Max van den Berg - Sr. System Architect for Semiconductor Industry at Festo SE & Co. KG
At Festo I am a global acting system architect for our customers in the Semiconductor industry. I cooperate with system engineers of the OEM’s, as well as the IDM’s to find the right solution for their challenges in Fab-automation. My background is in Mechatronics and Product Development. I am also active in the SEMI organisation in the field of gas delivery standards and component cleanliness.

Thermo Fischer Scientific Electron Microscopes require a very high cleanliness level for an optimal performance, especially the parts and modules in contact with the vacuum environments (HV and UHV/XHV). The cleanliness in the manufacturing process and the manufacturing process itself of the parts and modules plays an important role in the final result. In the presentation the manufacturing aspects will be highlighted, the specification and validation will be presented and examples shown.

Rients de Groot – Systems Design Engineer at Thermo Fisher Scientific – Electron Microscopy
I‘m working in the R&D department for 23 Years and have experience gained in the development of modules and systems. The last 15 years vacuum is one of the main subjects to work on and I’m involved in developing vacuum systems and modules, that includes the manufacturability and contamination related issues.

ASML’s most stringent cleanliness requirements, known as grade 1, are so challenging that focusing only on cleaning will not cut it anymore. Instead, cleanliness will have to be taken into account in the entire production chain: from design to qualification and from manufacturing individual parts to assembling a module.

Dirk Trienekens - Project lead cleanliness support at ASML
Just over 3 years ago I started at ASML, as a cleanliness expert in the Cleanliness of Parts competence within ASML. After my first project where I developed the new ASML cleanliness standards (GSAs), I am now leading the cleanliness support project, which is supporting ASML hardware projects and suppliers facing our most stringent cleanliness requirements.

Cleanliness is about determining the accepted amount of particles and/or chemical (molecular) contamination on functional product surfaces. To achieve a specified cleanliness level, the entire manufacturing chain must be taken into account. Where can contamination occur? Can it be prevented or removed? Measuring and monitoring the surface cleanliness of (test) products helps in understanding and tackling contamination. Cleaning processes are necessary to remove the unwanted contamination, but these will also affect the surface. Therefore a good compromise will have to be found to prevent disruption of the functionality of the product.

Koos Agricola - Contamination control specialist at Brookhuis Applied Data Intelligence
Since 1986 I have been active in cleaning product surfaces and keeping them clean. In addition to measuring and cleaning surfaces, it was also important to learn how to keep a product clean by applying cleanroom technology. For photoconductors and inkjet printhead, particles and chemical contamination were important. For the control of fatal particle contamination, the particle deposition rate parameter turned out to be much more important than cleanroom classification.Besides and after Océ-Canon Production Printing, providing monitoring tools and applying the obtained data at Brookhuis Applied Data Intelligence is important to help companies get their cleanliness chain in order.Through VCCN and NEN I was able to build up an international knowledge network and contribute to the development of cleanroom standards. I like to share this through training/courses and lectures.