Programma van ICCCS Webinar (powered by VCCN)
ICCCS Webinar (powered by VCCN)
Programma van ICCCS Webinar (powered by VCCN)
Op woensdag 13 april: | |
14:00 - 14:30 | Contamination Control 2050 (Eric Stuiver & Chris Perry) |
14:30 - 15:00 | Ultra-clean vacuum, the right level at the right location (Freek Molkenboer - TNO) |
15:00 - 15:30 | Particle deposition rate key to CC (Koos Agricola - Brookhuis Applied Data Intelligence) |
15:30 - 16:00 | Discussion (lead by chair Frans Saurwalt) |
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Van 14:00 tot 14:30
Contamination Control 2050 (Eric Stuiver & Chris Perry)
- World needs Contamination Control
- Science & Technology Trends
- Facility impacts
- Effects on the Dutch value chain
- Outlook and ...
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Van 14:30 tot 15:00
Ultra-clean vacuum, the right level at the right location (Freek Molkenboer - TNO)
Vacuum cleanliness has become very important in several applications. With this cleanliness need, the cost of production has increased significantly. This presentation will explain with examples from the field why the right cleanliness level at the right location is needed, and applying the right level at the right location can save cost.
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Van 15:00 tot 15:30
Particle deposition rate key to CC (Koos Agricola - Brookhuis Applied Data Intelligence)
Contamination Control is about managing the accepted amount of particles and/or chemical (molecular) contamination on functional product surfaces. To achieve a specified cleanliness level, the entire manufacturing chain must be taken into account. Where can contamination occur? Can it be prevented or removed? This means that the particle deposition from the surrounding operation and the air determines what level of product cleanliness can be achieved. Monitoring the particle deposition rate provides essential insight to manage the clean room operations.